Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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palladium(II) hexafluoroacetylacetonate, Pd(hfac)2, CAS# 64916-48-9

Where to buy

NumberVendorRegionLink
1Strem Chemicals, Inc.🇺🇸Palladium(II) hexafluoroacetylacetonate, min. 95%

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 9 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Plasma-Assisted Atomic Layer Deposition of Palladium
2Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
3Plasma-enhanced atomic layer deposition of palladium on a polymer substrate
4Direct Plating of Cu on Pd Plasma Enhanced Atomic Layer Deposition Coated TaN Barrier
5Atomic layer deposition of Pd and Pt nanoparticles for catalysis: on the mechanisms of nanoparticle formation
6Tuning size and coverage of Pd nanoparticles using atomic layer deposition
7Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
8Shuffling Atomic Layer Deposition Gas Sequences to Modulate Bimetallic Thin Films and Nanoparticle Properties
9In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd