Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition

Type:
Journal
Info:
Nanotechnology 26 (2015) 094002
Date:
2015-01-15
DOI:
http://stacks.iop.org/0957-4484/26/i=9/a=094002

Author Information

Name Institution
Matthieu J. WeberEindhoven University of Technology
Marcel A. VerheijenEindhoven University of Technology
Ageeth A. BolEindhoven University of Technology
Erwin (W.M.M.) KesselsEindhoven University of Technology

Films

Plasma Pt

Hardware used: Custom
(Trimethyl)methylcyclopentadienylplatinum, MeCpMe3Pt
CAS#: 94442-22-5
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 100C

Plasma Pd

Hardware used: Custom
palladium(II) hexafluoroacetylacetonate, Pd(hfac)2
CAS#: 64916-48-9
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
H2, Hydrogen
CAS#: 1333-74-0

Where to buy onsite generators

Deposition Temperature = 100C

Film/Plasma Properties

Substrates

Notes

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