Plasma-enhanced atomic layer deposition of palladium on a polymer substrate
Type:
Journal
Info:
Chem. Vap. Deposition 2007, 13, 307–311
Date:
2007-07-10
Author Information
| Name | Institution |
|---|---|
| Gregory A. Ten Eyck | Rensselaer Polytechnic Institute (RPI) |
| Samuk Pimanpang | Rensselaer Polytechnic Institute (RPI) |
| Jasbir S. Juneja | Rensselaer Polytechnic Institute (RPI) |
| Hassaram Bakhru | State University of New York at Albany |
| Toh-Ming Lu | Rensselaer Polytechnic Institute (RPI) |
| Gwo-Ching Wang | Rensselaer Polytechnic Institute (RPI) |
Films
Plasma Pd
Film/Plasma Properties
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Bonding States
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Gas Phase Species
Analysis: QMS, Quadrupole Mass Spectrometer
Characteristic: Thickness
Analysis: RBS, Rutherford Backscattering Spectrometry
Substrates
| poly(p-xylene) |
| Parylene-N |
| PPX |
| Si with native oxide |
Notes
| 30 |