Publication Information

Title:
Plasma-enhanced atomic layer deposition of palladium on a polymer substrate
Type:
Journal
Info:
Chem. Vap. Deposition 2007, 13, 307–311
Date:
2007-07-10

Author Information

Name Institution
Gregory A. Ten EyckRensselaer Polytechnic Institute (RPI)
Samuk PimanpangRensselaer Polytechnic Institute (RPI)
Jasbir S. JunejaRensselaer Polytechnic Institute (RPI)
Hassaram BakhruState University of New York at Albany
Toh-Ming LuRensselaer Polytechnic Institute (RPI)
Gwo-Ching WangRensselaer Polytechnic Institute (RPI)

Films


Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Bonding States
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Gas Phase Species
Analysis: QMS, Quadrupole Mass Spectrometer

Characteristic: Thickness
Analysis: RBS, Rutherford Backscattering Spectrometry

Substrates

poly(p-xylene)
Parylene-N
PPX
Si with native oxide

Keywords

Amine
Palladium
Parylene-N
Plasma-Enhanced Atomic Layer Deposition
Polymer

Notes

30