Publication Information

Title: Plasma-Assisted Atomic Layer Deposition of Palladium

Type: Journal

Info: Chem. Vap. Deposition 2005, 11, No. 1

Date: 2004-06-01

DOI: http://dx.doi.org/10.1002/cvde.200306312

Author Information

Name

Institution

Rensselaer Polytechnic Institute (RPI)

Rensselaer Polytechnic Institute (RPI)

Rensselaer Polytechnic Institute (RPI)

Rensselaer Polytechnic Institute (RPI)

Rensselaer Polytechnic Institute (RPI)

Rensselaer Polytechnic Institute (RPI)

Rensselaer Polytechnic Institute (RPI)

Rensselaer Polytechnic Institute (RPI)

State University of New York at Albany

State University of New York at Albany

Films

Plasma Pd using Custom ICP

Deposition Temperature = 80C

64916-48-9

1333-74-0

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Density

RBS, Rutherford Backscattering Spectrometry

Unknown

Thickness

RBS, Rutherford Backscattering Spectrometry

Unknown

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Unknown

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

Veeco Autoprobe CP

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

RHEED, Reflection High-Energy Electron Diffraction

Unknown

Substrates

Silicon

W

Ir

Keywords

Notes

1179



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