Publication Information

Title:
Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
Type:
Journal
Info:
J. Phys. Chem. C, 2014, 118 (16), pp 8702-8711
Date:
2014-04-02

Author Information

Name Institution
Matthieu J. WeberEindhoven University of Technology
Adriaan J. M. MackusEindhoven University of Technology
Marcel A. VerheijenEindhoven University of Technology
Valentino LongoEindhoven University of Technology
Ageeth A. BolEindhoven University of Technology
Erwin (W.M.M.) KesselsEindhoven University of Technology

Films

Plasma Pd


Plasma Pd


Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Compositional Depth Profiling
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry

Characteristic: Microstructure
Analysis: XRD, X-Ray Diffraction

Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity

Characteristic: Density
Analysis: XRR, X-Ray Reflectivity

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Raman Shift
Analysis: Four-point Probe

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Gas Phase Species
Analysis: FTIR, Fourier Transform InfraRed spectroscopy

Characteristic: Nucleation
Analysis: TEM, Transmission Electron Microscope

Substrates

Al2O3

Keywords

Nucleation

Notes

Paper available in on-line thesis
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