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Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
Type:
Journal
Info:
J. Phys. Chem. C, 2014, 118 (16), pp 8702-8711
Date:
2014-04-02
Author Information
| Name | Institution |
|---|---|
| Matthieu J. Weber | Eindhoven University of Technology |
| Adriaan J. M. Mackus | Eindhoven University of Technology |
| Marcel A. Verheijen | Eindhoven University of Technology |
| Valentino Longo | Eindhoven University of Technology |
| Ageeth A. Bol | Eindhoven University of Technology |
| Erwin (W.M.M.) Kessels | Eindhoven University of Technology |
Films
Film/Plasma Properties
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Compositional Depth Profiling
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry
Characteristic: Microstructure
Analysis: XRD, X-Ray Diffraction
Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Characteristic: Density
Analysis: XRR, X-Ray Reflectivity
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Raman Shift
Analysis: Four-point Probe
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Gas Phase Species
Analysis: FTIR, Fourier Transform InfraRed spectroscopy
Characteristic: Nucleation
Analysis: TEM, Transmission Electron Microscope
Substrates
| Al2O3 |
Notes
| Paper available in on-line thesis |
| 556 |