Publication Information

Title: Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas

Type: Journal

Info: J. Phys. Chem. C, 2014, 118 (16), pp 8702-8711

Date: 2014-04-02

DOI: http://dx.doi.org/10.1021/jp5009412

Author Information

Name

Institution

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Films

Plasma Pd using Custom

Deposition Temperature Range = 50-200C

64916-48-9

1333-74-0

Plasma Pd using Custom

Deposition Temperature Range = 50-200C

64916-48-9

1333-74-0

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Thermo Scientific K-Alpha

Compositional Depth Profiling

XPS, X-ray Photoelectron Spectroscopy

Thermo Scientific K-Alpha

Chemical Composition, Impurities

RBS, Rutherford Backscattering Spectrometry

Unknown

Microstructure

XRD, X-Ray Diffraction

PANalytical Xpert PRO MRD X-ray Diffractometer

Thickness

XRR, X-Ray Reflectivity

PANalytical Xpert PRO MRD X-ray Diffractometer

Density

XRR, X-Ray Reflectivity

PANalytical Xpert PRO MRD X-ray Diffractometer

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

NT-MDT Solver P47SPM

Raman Shift

Four-point Probe

Signatone

Thickness

Ellipsometry

J.A. Woollam M-2000U

Gas Phase Species

FTIR, Fourier Transform InfraRed spectroscopy

Bruker Optics Vector 22

Nucleation

TEM, Transmission Electron Microscope

FEI Technai F20

Substrates

Al2O3

Keywords

Nucleation

Notes

Paper available in on-line thesis

556



Shortcuts



© 2014-2018 plasma-ald.com