Shuffling Atomic Layer Deposition Gas Sequences to Modulate Bimetallic Thin Films and Nanoparticle Properties
Type:
Journal
Info:
Chem. Mater. 2022, 34, 6142-6154
Date:
2022-06-15
Author Information
| Name | Institution |
|---|---|
| Matthias Filez | Ghent University |
| Ji-Yu Feng | Ghent University |
| Matthias M. Minjauw | Ghent University |
| Eduardo Solano | ALBA Synchrotron Light Source, NCD-SWEET Beamline |
| Nithin Poonkottil | Ghent University |
| Michiel Van Daele | Ghent University |
| Ranjith K. Ramachandran | Ghent University |
| Chen Li | University of Antwerp |
| Sara Bals | University of Antwerp |
| Hilde Poelman | Ghent University |
| Christophe Detavernier | Ghent University |
| Jolien Dendooven | Ghent University |
Films
Plasma PdRu
Film/Plasma Properties
Characteristic: Nucleation
Analysis: GISAXS, Grazing Incidence Small Angle X-ray Scattering
Characteristic: Chemical Composition, Impurities
Analysis: XRF, X-Ray Fluorescence
Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIWAXS, Grazing Incidence Wide Angle X-ray Scattering
Characteristic: Images
Analysis: TEM, Transmission Electron Microscope
Characteristic: Chemical Composition, Impurities
Analysis: ELS, EELS, Electron Energy Loss Spectroscopy
Substrates
| Si with native oxide |
| Si3N4 |
Notes
| 1740 |