Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Hilde Poelman Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Hilde Poelman returned 5 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Tuning size and coverage of Pd nanoparticles using atomic layer deposition
2Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
3Shuffling Atomic Layer Deposition Gas Sequences to Modulate Bimetallic Thin Films and Nanoparticle Properties
4Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
5Plasma enhanced atomic layer deposition of Ga2O3 thin films