Publication Information

Title: Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide

Type: Journal

Info: Journal of The Electrochemical Society, 156 (7) P122-P126 (2009)

Date: 2009-05-19

DOI: http://dx.doi.org/10.1149/1.3133169

Author Information

Name

Institution

Ghent University

Ghent University

Ghent University

Ghent University

Ghent University

SCK-CEN

Ghent University

Films

Thermal VOx using Custom

Deposition Temperature Range = 50-300C

5588-84-1

7732-18-5

Thermal VOx using Custom

Deposition Temperature Range = 50-300C

5588-84-1

7782-44-7

Plasma VOx using Custom

Deposition Temperature Range = 50-300C

5588-84-1

7732-18-5

Plasma VOx using Custom

Deposition Temperature Range = 50-300C

5588-84-1

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

OES

OES, Optical Emission Spectroscopy

Ocean Optics QE65000 Spectrometer

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

Bruker D8 Discover

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

VG Scientific ESCALAB 220iXL

Thickness

XRR, X-Ray Reflectivity

Bruker D8 Discover

Substrates

SiO2

Keywords

PEALD Film Development

Notes

Above 200C, VTIP thermally decomposes and CVD is obtained.

Thermal and PEALD V2O5 comparison with O2 and H2O co-reactants.

299



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