Publication Information

Title:
Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
Type:
Journal
Info:
Journal of The Electrochemical Society, 156 (7) P122-P126 (2009)
Date:
2009-05-19

Author Information

Name Institution
Jan MusschootGhent University
Davy DeduytscheGhent University
Hilde PoelmanGhent University
Jo HaemersGhent University
Ronald L. Van MeirhaegheGhent University
Sven Van den BergheSCK-CEN
Christophe DetavernierGhent University

Films

Thermal VOx


Thermal VOx


Plasma VOx


Plasma VOx


Film/Plasma Properties

Characteristic: OES
Analysis: OES, Optical Emission Spectroscopy

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity

Substrates

SiO2

Keywords

PEALD Film Development

Notes

Above 200C, VTIP thermally decomposes and CVD is obtained.
Thermal and PEALD V2O5 comparison with O2 and H2O co-reactants.
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