Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:

  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.



Ronald L. Van Meirhaeghe Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Ronald L. Van Meirhaeghe returned 8 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
2Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
3Diffusion barrier properties of TaNx films prepared by plasma enhanced atomic layer deposition from PDMAT with N2 or NH3 plasma
4Ru thin film grown on TaN by plasma enhanced atomic layer deposition
5Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
6Atomic layer deposition of titanium nitride from TDMAT precursor
7Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
8Texture of atomic layer deposited ruthenium