Publication Information

Title:
Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
Type:
Journal
Info:
J. Phys. Chem. C, 2015, 119 (21), pp 11786-11791
Date:
2015-05-08

Author Information

Name Institution
Ranjith K. RamachandranGhent University
Jolien DendoovenGhent University
Hilde PoelmanGhent University
Christophe DetavernierGhent University

Films

Plasma In2O3


Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Optical Properties
Analysis: Ellipsometry

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Transmittance
Analysis: Ellipsometry

Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe

Characteristic: Gas Phase Species
Analysis: QMS, Quadrupole Mass Spectrometer

Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity

Characteristic: Thickness
Analysis: XRF, X-Ray Fluorescence

Characteristic: Conformality, Step Coverage
Analysis: XRF, X-Ray Fluorescence

Substrates

SiO2

Keywords

Notes

352