Search 1628 plasma ALD publications by:
In(TMHD)3, tris(2,2,6,6-tetramethyl-3,5-heptanedionato) indium, CAS# 34269-03-9
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|3||Strem Chemicals, Inc.||Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)indium(III), 99% (99.9%-In) [In(TMHD)3]|
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Plasma Enhanced Atomic Layer Deposition Film Publications
Your search for publications using this chemistry returned 2 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.
|1||Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films|
|2||On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies|