Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


In(TMHD)3, tris(2,2,6,6-tetramethyl-3,5-heptanedionato) indium, CAS# 34269-03-9

Where to buy

NumberVendorRegionLink
1Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈTris(2,2,6,6-tetramethyl-3,5-heptanedionato)indium(III), 99% (99.9%-In) [In(TMHD)3]
2Pegasus ChemicalsπŸ‡¬πŸ‡§Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)indium
3EreztechπŸ‡ΊπŸ‡ΈTris(2,2,6,6-tetramethyl-3,5-heptanedionato) indium(III)

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 3 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1On the determination of Ο‡(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
2Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
3Plasma-induced sub-10nm Au-SnO2-In2O3 heterostructures fabricated by atomic layer deposition for highly sensitive ethanol detection on ppm level