Publication Information

Title: On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies

Type: Journal

Info: Scientific Reports 7:44581 (2017)

Date: 2017-02-10

DOI: http://dx.doi.org/10.1038/srep44581

Author Information

Name

Institution

Ghent University

Karlsruhe Institute of Technology (KIT)

Tampere University of Technology

Karlsruhe Institute of Technology (KIT)

Ghent University

Ghent University

Ghent University

Ghent University

Karlsruhe Institute of Technology (KIT)

Karlsruhe Institute of Technology (KIT)

Ghent University

Films

Plasma TiO2 using Custom ICP

Deposition Temperature = 120C

3275-24-9

7782-44-7

Plasma Al2O3 using Custom ICP

Deposition Temperature = 120C

75-24-1

7782-44-7

Plasma In2O3 using Custom ICP

Deposition Temperature = 120C

34269-03-9

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Substrates

Glass

Keywords

Optoelectronics

Photonics

Notes

1105



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