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RuO4, ruthenium tetroxide, CAS# 20427-56-9

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 2 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Mobile setup for synchrotron based in situ characterization during thermal and plasma-enhanced atomic layer deposition
2Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H2-plasma

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Mark Sowa

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