RuO4, ruthenium tetroxide, Air Liquide ToRuSTM, CAS# 20427-56-9

Plasma Enhanced Atomic Layer Deposition Film Publications

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NumberTitle
1Mobile setup for synchrotron based in situ characterization during thermal and plasma-enhanced atomic layer deposition
2Shuffling Atomic Layer Deposition Gas Sequences to Modulate Bimetallic Thin Films and Nanoparticle Properties
3Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H2-plasma