Mobile setup for synchrotron based in situ characterization during thermal and plasma-enhanced atomic layer deposition

Publication Information

Title: Mobile setup for synchrotron based in situ characterization during thermal and plasma-enhanced atomic layer deposition

Type: Journal

Info: Review of Scientific Instruments 87, 113905 (2016)

Date: 2016-10-31

DOI: http://dx.doi.org/10.1063/1.4967711

Author Information

Name

Institution

Jolien Dendooven

Ghent University

Eduardo Solano

Ghent University

Matthias M. Minjauw

Ghent University

Kevin Van de Kerckhove

Ghent University

Alessandro Coati

Synchrotron SOLEIL

Emiliano Fonda

Synchrotron SOLEIL

Giuseppe Portale

European Synchrotron Radiation Facility (ESRF)

Yves Garreau

Synchrotron SOLEIL

Christophe Detavernier

Ghent University

Films

Thermal Ru using Custom

Deposition Temperature = 100C

RuO₄, ruthenium tetroxide

20427-56-9

H₂, Hydrogen

1333-74-0

Plasma Ru using Custom

Deposition Temperature = 100C

RuO₄, ruthenium tetroxide

20427-56-9

H₂, Hydrogen

1333-74-0

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Nucleation

XRF, X-Ray Fluorescence

Synchrotron

Nucleation

GISAXS, Grazing Incidence Small Angle X-ray Scattering

Synchrotron

Substrates

Si-H

SiO₂

Keywords

Notes

879

Mark Sowa

Shortcuts

Films

Precursors

Deposition Hardware

Film and Plasma Characteristics

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