Mobile setup for synchrotron based in situ characterization during thermal and plasma-enhanced atomic layer deposition

Type:
Journal
Info:
Review of Scientific Instruments 87, 113905 (2016)
Date:
2016-10-31
DOI:
http://dx.doi.org/10.1063/1.4967711

Author Information

Name Institution
Jolien DendoovenGhent University
Eduardo SolanoGhent University
Matthias M. MinjauwGhent University
Kevin Van de KerckhoveGhent University
Alessandro CoatiSynchrotron SOLEIL
Emiliano FondaSynchrotron SOLEIL
Giuseppe PortaleEuropean Synchrotron Radiation Facility (ESRF)
Yves GarreauSynchrotron SOLEIL
Christophe DetavernierGhent University

Films

Thermal Ru

Hardware used: Custom
RuO4, ruthenium tetroxide
CAS#: 20427-56-9
H2, Hydrogen
CAS#: 1333-74-0

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Deposition Temperature = 100C

Plasma Ru

Hardware used: Custom
RuO4, ruthenium tetroxide
CAS#: 20427-56-9
H2, Hydrogen
CAS#: 1333-74-0

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Deposition Temperature = 100C

Film/Plasma Properties

Characteristic: Nucleation
Analysis: XRF, X-Ray Fluorescence
Diagnostic: Synchrotron

Characteristic: Nucleation
Analysis: GISAXS, Grazing Incidence Small Angle X-ray Scattering
Diagnostic: Synchrotron

Substrates

Si-H
SiO2

Keywords

Notes

879