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Infrared single-photon sensitivity in atomic layer deposited superconducting nanowires
Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films
Gallium nitride thin films by microwave plasma-assisted ALD
Ferroelectricity of HfxZr1-xO2 thin films fabricated by 300°C low temperature process with plasma-enhanced atomic layer deposition
Hydrogen-induced abstraction mechanism of surface methyl groups in atomic-layer-epitaxy of germanium
Mobile setup for synchrotron based in situ characterization during thermal and plasma-enhanced atomic layer deposition
Type:
Journal
Info:
Review of Scientific Instruments 87, 113905 (2016)
Date:
2016-10-31
Author Information
| Name | Institution |
|---|---|
| Jolien Dendooven | Ghent University |
| Eduardo Solano | Ghent University |
| Matthias M. Minjauw | Ghent University |
| Kevin Van de Kerckhove | Ghent University |
| Alessandro Coati | Synchrotron SOLEIL |
| Emiliano Fonda | Synchrotron SOLEIL |
| Giuseppe Portale | European Synchrotron Radiation Facility (ESRF) |
| Yves Garreau | Synchrotron SOLEIL |
| Christophe Detavernier | Ghent University |
Films
Film/Plasma Properties
Characteristic: Nucleation
Analysis: XRF, X-Ray Fluorescence
Characteristic: Nucleation
Analysis: GISAXS, Grazing Incidence Small Angle X-ray Scattering
Substrates
| Si-H |
| SiO2 |
Notes
| 879 |