Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H2-plasma
Type:
Journal
Info:
J. Mater. Chem. C, 2015, 3, 4848-4851
Date:
2015-04-20
Author Information
Name | Institution |
---|---|
Matthias M. Minjauw | Ghent University |
Jolien Dendooven | Ghent University |
Boris Capon | Ghent University |
Marc Schaekers | IMEC |
Christophe Detavernier | Ghent University |
Films
Film/Plasma Properties
Substrates
Notes
509 |