
Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H2-plasma
Type:
Journal
Info:
J. Mater. Chem. C, 2015, 3, 4848-4851
Date:
2015-04-20
Author Information
Name | Institution |
---|---|
Matthias M. Minjauw | Ghent University |
Jolien Dendooven | Ghent University |
Boris Capon | Ghent University |
Marc Schaekers | IMEC |
Christophe Detavernier | Ghent University |
Films
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Substrates
Pt |
Si-H |
Polypropylene |
Polyethylene |
Polystyrene |
Notes
509 |