Publication Information

Title:
Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H2-plasma
Type:
Journal
Info:
J. Mater. Chem. C, 2015, 3, 4848-4851
Date:
2015-04-20

Author Information

Name Institution
Matthias M. MinjauwGhent University
Jolien DendoovenGhent University
Boris CaponGhent University
Marc SchaekersIMEC
Christophe DetavernierGhent University

Films

Plasma Ru


Film/Plasma Properties

Substrates

Keywords

Notes

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