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Publication Information

Title: Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing

Type: Conference Proceedings

Info: Proceedings of the 2nd International Conference on Crystalline Silicon Photovoltaics SiliconPV 2012

Date: 2012-04-02

DOI: http://dx.doi.org/10.1016/j.egypro.2012.07.088

Author Information

Name

Institution

University of Konstanz

University of Konstanz

University of Konstanz

University of Konstanz

University of Konstanz

Films

Deposition Temperature Range = 170-400C

75-24-1

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Substrate Temperature

Ellipsometry

J.A. Woollam M-2000

Thickness

Ellipsometry

Unknown

Refractive Index

Ellipsometry

Unknown

Passivation

Photoconductance

Sinton WCT-120 Lifetime Tester

Lifetime

Photoconductance

Sinton WCT-120 Lifetime Tester

Images

Optical Microscopy

Unknown

Blistering

Optical Microscopy

Unknown

Images

SEM, Scanning Electron Microscopy

Unknown

Blistering

SEM, Scanning Electron Microscopy

Unknown

Chemical Composition, Impurities

EDS, EDX, Energy Dispersive X-ray Spectroscopy

Unknown

Substrates

Silicon

Keywords

Passivation

Notes

627


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