Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition

Type:
Journal
Info:
J. Phys. Chem. C, 2019, 123 (7), pp 4109 - 4115
Date:
2019-01-18
DOI:
http://dx.doi.org/10.1021/acs.jpcc.8b12216

Author Information

Name Institution
Norah HornsveldEindhoven University of Technology
Erwin (W.M.M.) KesselsEindhoven University of Technology
Mariadriana CreatoreEindhoven University of Technology

Films

Thermal Li2CO3

Hardware used: Oxford Instruments FlexAL
LiOt-Bu, LiOtBu, LTB, Lithium tert-butoxide, Lithium tertiary butoxide, LiOC4H9
CAS#: 1907-33-1
Where to buy precursor
H2O, Water
CAS#: 7732-18-5
Where to buy precursor
CO2, Carbon Dioxide
CAS#: 124-38-9
Deposition Temperature = 150C

Plasma Li2CO3

Hardware used: Oxford Instruments FlexAL
LiOt-Bu, LiOtBu, LTB, Lithium tert-butoxide, Lithium tertiary butoxide, LiOC4H9
CAS#: 1907-33-1
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range = 150-200C

Plasma Li2O

Hardware used: Oxford Instruments FlexAL
LiOt-Bu, LiOtBu, LTB, Lithium tert-butoxide, Lithium tertiary butoxide, LiOC4H9
CAS#: 1907-33-1
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range = 200-300C

Film/Plasma Properties

Characteristic: Gas Phase Species
Analysis: QMS, Quadrupole Mass Spectrometer
Diagnostic: Pfeiffer QMS

Substrates

Notes

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