CO2, Carbon Dioxide, CAS# 124-38-9

Plasma Enhanced Atomic Layer Deposition Film Publications

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NumberTitle
1Oxide TFT LC Oscillators on Glass and Plastic for Wireless Functions in Large-Area Flexible Electronic Systems
2Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
3Plasma enhanced atomic layer deposition of SiNx:H and SiO2
4Fabrication and Characterization of Flexible Thin Film Transistors on Thin Solution-Cast Substrates
5Fast Flexible Plastic Substrate ZnO Circuits
6Low-Power Double-Gate ZnO TFT Active Rectifier
7Fast PEALD ZnO Thin-Film Transistor Circuits
8Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
9Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
10Oxide semiconductor thin film transistors on thin solution-cast flexible substrates