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Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
Type:
Journal
Info:
RSC Adv., 2017, 7, 41359-41368
Date:
2017-08-10
Author Information
| Name | Institution |
|---|---|
| Norah Hornsveld | Eindhoven University of Technology |
| B. Put | Eindhoven University of Technology |
| Erwin (W.M.M.) Kessels | Eindhoven University of Technology |
| Philippe M Vereecken | Ghent University |
| Mariadriana Creatore | Eindhoven University of Technology |
Films
Thermal Li2CO3
Plasma Li2CO3
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Chemical Composition, Impurities
Analysis: TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis
Characteristic: Chemical Composition, Impurities
Analysis: EBS, Elastic Backscattering
Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Battery Properties
Analysis: EIS, Electrochemical Impedance Spectroscopy
Substrates
| TiN |
Notes
| Precursor decomposes at 350C according to ref 27. |
| 1030 |