Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:

  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.



Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3

Type:
Journal
Info:
RSC Adv., 2017, 7, 41359-41368
Date:
2017-08-10

Author Information

Name Institution
Norah HornsveldEindhoven University of Technology
B. PutEindhoven University of Technology
Erwin (W.M.M.) KesselsEindhoven University of Technology
Philippe M VereeckenGhent University
Mariadriana CreatoreEindhoven University of Technology

Films



Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Refractive Index
Analysis: Ellipsometry

Characteristic: Chemical Composition, Impurities
Analysis: TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis

Characteristic: Chemical Composition, Impurities
Analysis: EBS, Elastic Backscattering

Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Battery Properties
Analysis: EIS, Electrochemical Impedance Spectroscopy

Substrates

TiN

Notes

Precursor decomposes at 350C according to ref 27.
1030