Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:

  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Oxide TFT LC Oscillators on Glass and Plastic for Wireless Functions in Large-Area Flexible Electronic Systems

Type:
Conference Proceedings
Info:
2016 SID Symposium Digest of Technical Papers 18-2
Date:
2016-05-25

Author Information

Name Institution
Yasmin AfsarPrinceton University
Jenny TangPrinceton University
Warren Rieutort-LouisPrinceton University
Liechao HuangPrinceton University
Yingzhe HuPrinceton University
Josue Sanz-RobinsonPrinceton University
Sigurd WagnerPrinceton University
Naveen VermaPrinceton University
James C. SturmPrinceton University

Films

Plasma ZnO



Film/Plasma Properties

Substrates

Notes

Plasma chemistry assumed from reference 7.
883