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Infrared single-photon sensitivity in atomic layer deposited superconducting nanowires
Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films
Gallium nitride thin films by microwave plasma-assisted ALD
Ferroelectricity of HfxZr1-xO2 thin films fabricated by 300°C low temperature process with plasma-enhanced atomic layer deposition
Hydrogen-induced abstraction mechanism of surface methyl groups in atomic-layer-epitaxy of germanium
Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
Type:
Journal
Info:
Journal of The Electrochemical Society, 156 (4) H255-H262 (2009)
Date:
2008-11-13
Author Information
| Name | Institution |
|---|---|
| Sonja Sioncke | IMEC |
Films
Thermal Al2O3
Plasma Al2O3
Film/Plasma Properties
Substrates
Notes
| 198 |