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Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
Type:
Journal
Info:
Journal of The Electrochemical Society, 156 (4) H255-H262 (2009)
Date:
2008-11-13
Author Information
| Name | Institution |
|---|---|
| Sonja Sioncke | IMEC |
Films
Thermal Al2O3
Plasma Al2O3
Film/Plasma Properties
Substrates
Keywords
Notes
| 198 |
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