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Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
Reaction Mechanism of the Metal Precursor Pulse in Plasma-Enhanced Atomic Layer Deposition of Cobalt and the Role of Surface Facets
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Publication Information
Title:
Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
Type:
Journal
Info:
Journal of The Electrochemical Society, 156 (4) H255-H262 (2009)
Date:
2008-11-13
Author Information
| Name | Institution |
|---|---|
| Sonja Sioncke | IMEC |
Films
Thermal Al2O3
Plasma Al2O3
Film/Plasma Properties
Substrates
Keywords
Notes
| 198 |
Popular Precursors
Top Authors
| Erwin (W.M.M.) Kessels |
| Hyeongtag Jeon |
| Hyungjun Kim |
| Mauritius C. M. (Richard) van de Sanden |
| Christophe Detavernier |