Publication Information

Title: Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates

Type: Journal

Info: Journal of The Electrochemical Society, 156 (4) H255-H262 (2009)

Date: 2008-11-13

DOI: http://dx.doi.org/10.1149/1.3076143

Author Information

Name

Institution

IMEC

Films

Thermal Al2O3 using ASM Pulsar 2000

Deposition Temperature = 300C

75-24-1

7732-18-5

Deposition Temperature = 300C

75-24-1

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Substrates

Keywords

Notes

198



Shortcuts



© 2014-2018 plasma-ald.com