Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


ASM Pulsar 2000 Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using ASM Pulsar 2000 hardware returned 2 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
2Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates