Publication Information

Title: Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization

Type: Journal

Info: Chem. Mater. 2017, 29, 2090-2100

Date: 2017-02-23

DOI: http://dx.doi.org/10.1021/acs.chemmater.6b04368

Author Information

Name

Institution

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Films

Deposition Temperature = 100C

7782-44-7

75-24-1

7732-18-5

Deposition Temperature = 100C

1333-74-0

75-24-1

7732-18-5

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Raman Spectra

Raman Spectroscopy

Renishaw Invia Raman

Mobility

Hall Measurements

Ecopia HMS-5300

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Thermo Scientific KA1066 spectrometer

Uniformity

SEM, Scanning Electron Microscopy

JEOL 7500F

Uniformity

AFM, Atomic Force Microscopy

NT-MDT Solver P47SPM

Uniformity

TEM, Transmission Electron Microscope

JEOL JEM ARM 200

Images

TEM, Transmission Electron Microscope

JEOL JEM ARM 200

Thickness

Ellipsometry

J.A. Woollam M-2000D

Substrates

Graphene

Keywords

Notes

1143



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