
Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
Type:
Journal
Info:
Chem. Mater. 2017, 29, 2090-2100
Date:
2017-02-23
Author Information
Name | Institution |
---|---|
René H. J. Vervuurt | Eindhoven University of Technology |
Bora Karasulu | Eindhoven University of Technology |
Marcel A. Verheijen | Eindhoven University of Technology |
Erwin (W.M.M.) Kessels | Eindhoven University of Technology |
Ageeth A. Bol | Eindhoven University of Technology |
Films
Other Al2O3
Other Al2O3
Film/Plasma Properties
Characteristic: Raman Spectra
Analysis: Raman Spectroscopy
Characteristic: Mobility
Analysis: Hall Measurements
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Uniformity
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Uniformity
Analysis: AFM, Atomic Force Microscopy
Characteristic: Uniformity
Analysis: TEM, Transmission Electron Microscope
Characteristic: Images
Analysis: TEM, Transmission Electron Microscope
Characteristic: Thickness
Analysis: Ellipsometry
Substrates
Graphene |
Notes
1143 |