Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization

Type:
Journal
Info:
Chem. Mater. 2017, 29, 2090-2100
Date:
2017-02-23

Author Information

Name Institution
René H. J. VervuurtEindhoven University of Technology
Bora KarasuluEindhoven University of Technology
Marcel A. VerheijenEindhoven University of Technology
Erwin (W.M.M.) KesselsEindhoven University of Technology
Ageeth A. BolEindhoven University of Technology

Films

Other Al2O3


Other Al2O3


Film/Plasma Properties

Characteristic: Raman Spectra
Analysis: Raman Spectroscopy

Characteristic: Mobility
Analysis: Hall Measurements

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Uniformity
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Uniformity
Analysis: AFM, Atomic Force Microscopy

Characteristic: Uniformity
Analysis: TEM, Transmission Electron Microscope

Characteristic: Images
Analysis: TEM, Transmission Electron Microscope

Characteristic: Thickness
Analysis: Ellipsometry

Substrates

Graphene

Keywords

Notes

1143