Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2

Type:
Journal
Info:
Journal of Vacuum Science & Technology A 36, 031602 (2018)
Date:
2018-02-18
DOI:
http://dx.doi.org/10.1116/1.5019170

Author Information

Name Institution
Abdullah H. AlshehriUniversity of Waterloo
Nathan Nelson-FitzpatrickUniversity of Waterloo
Khaled H. IbrahimUniversity of Waterloo
Kissan MistryUniversity of Waterloo
Mustafa YavuzUniversity of Waterloo
Kevin P. MusselmanUniversity of Waterloo

Films

Plasma TiON

Hardware used: Oxford Instruments FlexAL
TTIP, titanium(IV) isopropoxide, Ti(O-i-Pr)4
CAS#: 546-68-9
Where to buy precursor
N2, Nitrogen
CAS#: 7727-37-9
Deposition Temperature = 250C

Plasma TiO2

Hardware used: Oxford Instruments FlexAL
TTIP, titanium(IV) isopropoxide, Ti(O-i-Pr)4
CAS#: 546-68-9
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 250C

Film/Plasma Properties

Characteristic: Transmittance
Analysis: UV-VIS Spectroscopy
Diagnostic: Shimadzu UV-2501

Characteristic: Reflectance Spectra
Analysis: UV-VIS Spectroscopy
Diagnostic: Shimadzu UV-2501

Characteristic: Extinction Coefficient
Analysis: UV-VIS Spectroscopy
Diagnostic: Shimadzu UV-2501

Characteristic: Optical Bandgap
Analysis: UV-VIS Spectroscopy
Diagnostic: Shimadzu UV-2501

Characteristic: Optical Properties
Analysis: UV-VIS Spectroscopy
Diagnostic: Shimadzu UV-2501

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: J.A. Woollam M-2000DI

Characteristic: Refractive Index
Analysis: Ellipsometry
Diagnostic: J.A. Woollam M-2000DI

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: VG Scientific ESCALAB 250

Substrates

Si(100)
Glass

Notes

1547