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Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 36, 031602 (2018)
Date:
2018-02-18
Author Information
| Name | Institution |
|---|---|
| Abdullah H. Alshehri | University of Waterloo |
| Nathan Nelson-Fitzpatrick | University of Waterloo |
| Khaled H. Ibrahim | University of Waterloo |
| Kissan Mistry | University of Waterloo |
| Mustafa Yavuz | University of Waterloo |
| Kevin P. Musselman | University of Waterloo |
Films
Plasma TiON
Plasma TiO2
Film/Plasma Properties
Characteristic: Transmittance
Analysis: UV-VIS Spectroscopy
Characteristic: Reflectance Spectra
Analysis: UV-VIS Spectroscopy
Characteristic: Extinction Coefficient
Analysis: UV-VIS Spectroscopy
Characteristic: Optical Bandgap
Analysis: UV-VIS Spectroscopy
Characteristic: Optical Properties
Analysis: UV-VIS Spectroscopy
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Substrates
| Si(100) |
| Glass |
Notes
| 1547 |