Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Propagation Effects in Carbon Nanoelectronics

Type:
Journal
Info:
Int. J. Nanoelectronics and Materials 8 (2015) 91-­98
Date:
2015-01-21
DOI:
http://ijneam.unimap.edu.my/images/PDF/Vol_8_2/Vol%208_No%202_4_91-98.pdf

Author Information

Name Institution
Ehsan HosseiniIslamic Azad University

Films

Plasma Al2O3

Hardware used: Oxford Instruments FlexAL
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 300C

Film/Plasma Properties

Characteristic: Dielectric Constant, Permittivity
Analysis: -
Diagnostic: -

Characteristic: Breakdown Voltage
Analysis: -
Diagnostic: -

Substrates

Notes

Paper pulled from web site. Check google for cached copy.
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