Title: High-κ insulating materials for AlGaN/GaN metal insulator semiconductor heterojunction field effect transistors
Info: Solid-State Electronics, Volume 99, September 2014, Pages 25-30
University of Illinois at Chicago
Interface Trap Density
High-k Dielectric Thin Films
Oxford Instruments FlexAL PEALD Al, Hf, and Si oxides for MISHFET dielectrics.
I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. If you know of publications I have missed or a database entry is wrong, send me an email at: firstname.lastname@example.org
© 2014-2018 plasma-ald.com