Publication Information

Title: High-κ insulating materials for AlGaN/GaN metal insulator semiconductor heterojunction field effect transistors

Type: Journal

Info: Solid-State Electronics, Volume 99, September 2014, Pages 25-30

Date: 2014-04-23

DOI: http://dx.doi.org/10.1016/j.sse.2014.05.005

Author Information

Name

Institution

University of Illinois at Chicago

Films

Deposition Temperature Range N/A

Deposition Temperature Range N/A

Deposition Temperature Range N/A

Deposition Temperature Range N/A

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Interface Trap Density

Unknown

Unknown

Substrates

Keywords

High-k Dielectric Thin Films

Gate Dielectric

MISHFET

Notes

Oxford Instruments FlexAL PEALD Al, Hf, and Si oxides for MISHFET dielectrics.

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