Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
Type:
Journal
Info:
Angew. Chem. Int. Ed. 2020, 59, 17172 - 17176
Date:
2020-06-30
Author Information
Name | Institution |
---|---|
Haojie Zhang | Martin Luther University |
Dirk J. Hagen | Max Planck Institute of Microstructure Physics |
Xiaopeng Li | Donghua University |
Andreas Graff | Fraunhofer Institute for Microstructure of Materials and Systems IMWS |
Frank Heyroth | Martin Luther University |
Bodo Fuhrmann | Martin Luther University |
Ilya Kostanovskiy | Max Planck Institute of Microstructure Physics |
Stefan L. Schweizer | Martin Luther University |
Francesco Caddeo | Martin Luther University |
A. Wouter Maijenburg | Martin Luther University |
Stuart S. P. Parkin | Max Planck Institute of Microstructure Physics |
Ralf B. Wehrspohn | Martin Luther University |
Films
Plasma CoP
Plasma CoOx
Plasma Pt
Film/Plasma Properties
Characteristic: Thickness
Analysis: RBS, Rutherford Backscattering Spectrometry
Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry
Characteristic: Morphology, Roughness, Topography
Analysis: TEM, Transmission Electron Microscope
Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope
Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Compositional Depth Profiling
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Electrochemical Performance
Analysis: Linear Sweep Voltammetry
Characteristic: Electrochemical Performance
Analysis: EIS, Electrochemical Impedance Spectroscopy
Characteristic: Photoelectrochemical (PEC) Activity
Analysis: Photoelectrochemical (PEC) Activity
Substrates
Silicon |
FTO, F:SnO2 |
Notes
Most processing details in the supplementary information. |
1561 |