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An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Order of Dry and Wet Mixed-Length Self-Assembled Monolayers

Type:
Journal
Info:
J. Phys. Chem. C, 2015, 119 (42), pp 23943-23950
Date:
2015-09-11
DOI:
http://dx.doi.org/10.1021/acs.jpcc.5b06321

Author Information

Name Institution
Aliyah BarrettCornell University
Poul B. PetersenCornell University

Films

Plasma SiO2

Hardware used: Oxford Instruments FlexAL
Deposition Temperature = 110C

Film/Plasma Properties

Substrates

CaF2

Notes

400