Electrical Measurement Under Atmospheric Conditons of PbSe Nanocrystal Thin Films Passivated by Remote Plasma Atomic Layer Deposition of Al2O3

Type:
Journal
Info:
IEEE TRANSACTIONS ON NANOTECHNOLOGY, VOL. 12, NO.2, March 2013
Date:
2012-12-11

Author Information

Name Institution
W. YoonU.S. Naval Research Laboratory
A. R. SmithU.S. Naval Research Laboratory
Edward FoosU.S. Naval Research Laboratory
J. E. BoerckerU.S. Naval Research Laboratory
W. B. HeuerU.S. Naval Academy
J. G. TischlerU.S. Naval Research Laboratory

Films

Plasma Al2O3


Plasma HfO2

Hardware used: Unknown


Film/Plasma Properties

Characteristic: Electrical Properties
Analysis: I-V, Current-Voltage Measurements

Characteristic: Mobility
Analysis: I-V, Current-Voltage Measurements

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy

Substrates

Silicon
PbSe

Keywords

Passivation

Notes

646