Publication Information

Title: Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films

Type: Journal

Info: ACS Appl. Mater. Interfaces, 2016, 8 (21), pp 13590-13600

Date: 2016-05-11

DOI: http://dx.doi.org/10.1021/acsami.6b02292

Author Information

Name

Institution

University of British Columbia

Delft University of Technology

Delft University of Technology

University of British Columbia

University of British Columbia

Films

Deposition Temperature = 100C

75-24-1

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

-

Wetting Angle

Unknown

-

Water Vapor Transmission Rate (WVTR)

Cup Method

-

Water Vapor Permeability (WVP)

Cup Method

-

Air Permeability

Gurley Method

-

Morphology, Roughness, Topography

Profilometry

Wyko NT1100 Optical profilometer

Images

SEM, Scanning Electron Microscopy

Hitachi S-3000N-VP

Morphology, Roughness, Topography

SEM, Scanning Electron Microscopy

Hitachi S-3000N-VP

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Leybold MAX200

Chemical Composition, Impurities

FTIR, Fourier Transform InfraRed spectroscopy

Thermo Nicolet AVATAAR 360

Substrates

Paper

Silicon

Keywords

Notes

787



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