Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films

Type:
Journal
Info:
ACS Appl. Mater. Interfaces, 2016, 8 (21), pp 13590-13600
Date:
2016-05-11

Author Information

Name Institution
Mehr Negar MirvakiliUniversity of British Columbia
Hao Van BuiDelft University of Technology
J. Ruud van OmmenDelft University of Technology
Savvas G. HatzikiriakosUniversity of British Columbia
Peter EnglezosUniversity of British Columbia

Films

Plasma Al2O3


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Wetting Angle
Analysis: -

Characteristic: Water Vapor Transmission Rate (WVTR)
Analysis: Cup Method

Characteristic: Water Vapor Permeability (WVP)
Analysis: Cup Method

Characteristic: Air Permeability
Analysis: Gurley Method

Characteristic: Morphology, Roughness, Topography
Analysis: Profilometry

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Chemical Composition, Impurities
Analysis: FTIR, Fourier Transform InfraRed spectroscopy

Substrates

Paper
Silicon

Keywords

Notes

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