Reaction Mechanisms during Atomic Layer Deposition of AlF3 Using Al(CH3)3 and SF6 Plasma

Type:
Journal
Info:
J. Phys. Chem. C, 2021, 125 (7), pp 3913-3923
Date:
2021-01-11

Author Information

Name Institution
Martijn F. J. VosEindhoven University of Technology
Harm C. M. KnoopsEindhoven University of Technology
Erwin (W.M.M.) KesselsEindhoven University of Technology
Adriaan J. M. MackusEindhoven University of Technology

Films

Plasma AlF


Plasma AlF


Film/Plasma Properties

Characteristic: Gas Phase Species
Analysis: QMS, Quadrupole Mass Spectrometer

Characteristic: Plasma Species
Analysis: OES, Optical Emission Spectroscopy

Characteristic: Surface Reactions
Analysis: FTIR, Fourier Transform InfraRed spectroscopy

Substrates

Al2O3

Keywords

Notes

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