SF6, Sulfur Hexafluoride, CAS# 2551-62-4

Plasma Enhanced Atomic Layer Deposition Film Publications

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NumberTitle
1Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
2Reaction Mechanisms during Atomic Layer Deposition of AlF3 Using Al(CH3)3 and SF6 Plasma
3Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources
4Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma