Sulfur Hexafluoride, SF6, CAS# 2551-62-4

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 2 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
2Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources


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