Publication Information

Title:
The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
Type:
Conference Proceedings
Info:
ECS Transactions, 33 (2) 61-67 (2010)
Date:
2010-07-08

Author Information

Name Institution
H. B. ProfijtEindhoven University of Technology
P. KudlacekEindhoven University of Technology
Mauritius C. M. (Richard) van de SandenEindhoven University of Technology
Erwin (W.M.M.) KesselsEindhoven University of Technology

Films

Plasma Al2O3


Plasma Al2O3


Film/Plasma Properties

Characteristic: Ion Energy
Analysis: RFEA, Retarding Field Energy Analyzer

Characteristic: Ion Flux
Analysis: RFEA, Retarding Field Energy Analyzer

Characteristic: Ion Flux
Analysis: Custom

Characteristic: Electron Temperature, Te
Analysis: Langmuir Probe

Characteristic: Electron Density, ne
Analysis: Langmuir Probe

Characteristic: Gas Phase Species
Analysis: OES, Optical Emission Spectroscopy

Characteristic: Gas Phase Species
Analysis: OES, Optical Emission Spectroscopy

Characteristic: Minority Carrier Lifetime
Analysis: Photoconductance

Substrates

Silicon

Keywords

Passivation
Solar

Notes

718