Publication Information

Title:
Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
Type:
Journal
Info:
Microelectronic Engineering 97 (2012) 162 - 165
Date:
2012-05-28

Author Information

Name Institution
S. M. SultanUniversity of Southampton
O. D. ClarkUniversity of Southampton
T. B. MasaudUniversity of Southampton
Ziwen FangOxford Instruments
R. GunnOxford Instruments
M.M.A. HakimUniversity of Southampton
K. SunUniversity of Southampton
P. AshburnUniversity of Southampton
H. M. H. ChongUniversity of Southampton

Films

Plasma ZnO


Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Mobility
Analysis: Hall Measurements

Characteristic: Resistivity, Sheet Resistance
Analysis: Hall Measurements

Substrates

SiO2
Quartz

Keywords

Notes

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