Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
Type:
Journal
Info:
Microelectronic Engineering 97 (2012) 162 - 165
Date:
2012-05-28
Author Information
| Name | Institution |
|---|---|
| S. M. Sultan | University of Southampton |
| O. D. Clark | University of Southampton |
| T. B. Masaud | University of Southampton |
| Ziwen Fang | Oxford Instruments |
| R. Gunn | Oxford Instruments |
| M.M.A. Hakim | University of Southampton |
| K. Sun | University of Southampton |
| P. Ashburn | University of Southampton |
| H. M. H. Chong | University of Southampton |
Films
Plasma ZnO
Film/Plasma Properties
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Mobility
Analysis: Hall Measurements
Characteristic: Resistivity, Sheet Resistance
Analysis: Hall Measurements
Substrates
| SiO2 |
| Quartz |
Notes
| 664 |