Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:

  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.



T. B. Masaud Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by T. B. Masaud returned 2 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
2Electrical Characteristics of Top-Down ZnO Nanowire Transistors Using Remote Plasma ALD