Publication Information

Title:
Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
Type:
Journal
Info:
Nano Lett., 2017, 17 (10), pp 6287-6294
Date:
2017-09-05

Author Information

Name Institution
Lachlan E. BlackEindhoven University of Technology
A. CavalliEindhoven University of Technology
Marcel A. VerheijenEindhoven University of Technology
J. E. M. HaverkortEindhoven University of Technology
E. P. A. M. BakkersEindhoven University of Technology
Erwin (W.M.M.) KesselsEindhoven University of Technology

Films

Plasma POx


Plasma Al2O3


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Images
Analysis: TEM, Transmission Electron Microscope

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Bonding States
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Photoluminescence
Analysis: PL, PhotoLuminescence

Characteristic: IQE, Internal Quantum Efficiency
Analysis: PL, PhotoLuminescence

Substrates

InP
POx

Keywords

Nucleation
Passivation

Notes

1059