The publication database currently has 1609 entries.
Search from:
202 Films Compositions
272 Precursors and Plasma Gases
76 Deposition Hardwares
249 Film and Plasma Characteristics
85 Theses
Use Multifactor Search for more complex searches and for searching by other criteria (author, affiliation, analysis, deposition temperature)
ALD Links
Contact Us
Advertising
Recent Database Additions
Growth of Gallium Nitride Films on Multilayer Graphene Template Using Plasma-Enhanced Atomic Layer Deposition
Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
On the Contact Optimization of ALD-Based MoS2 FETs: Correlation of Processing Conditions and Interface Chemistry with Device Electrical Performance
Search 1609 plasma ALD publications by:
Search 1609 plasma ALD publications by:
Atomic layer deposition TiO2-Al2O3 stack: An improved gate dielectric on Ga-polar GaN metal oxide semiconductor capacitors
Type:
Journal
Info:
J. Vac. Sci. Technol. B 32(6), Nov/Dec 2014
Date:
2014-10-01
Author Information
| Name | Institution |
|---|---|
| Daming Wei | Kansas State University |
Films
Plasma Al2O3
Hardware used: Oxford Instruments FlexAL
Plasma TiO2
Hardware used: Oxford Instruments FlexAL
Film/Plasma Properties
Substrates
Keywords
Notes
| 203 |