Name

Institution

Gijs Dingemans

Eindhoven University of Technology

P. Engelhart

Q-CELLS SE

R. Seguin

Q-CELLS SE

F. Einsele

Forschungszentrum Jülich

Bram Hoex

Eindhoven University of Technology

Mauritius C. M. (Richard) van de Sanden

Eindhoven University of Technology

Erwin (W.M.M.) Kessels

Eindhoven University of Technology

Plasma Al₂O₃ using Oxford Instruments FlexAL

Deposition Temperature = 200C

TMA, Trimethyl Aluminum, Trimethylalane, Trimethylaluminium, Aluminium Trimethyl, Aluminum Trimethanide, Al(CH₃)₃, AlMe₃, Al₂(CH₃)₆, Al₂Me₆

75-24-1

Where to buy precursor

Oxygen, O₂

7782-44-7

Plasma Al₂O₃ using Oxford Instruments OpAL

Deposition Temperature = 200C

TMA, Trimethyl Aluminum, Trimethylalane, Trimethylaluminium, Aluminium Trimethyl, Aluminum Trimethanide, Al(CH₃)₃, AlMe₃, Al₂(CH₃)₆, Al₂Me₆

75-24-1

Where to buy precursor

Oxygen, O₂

7782-44-7

Characteristic

Analysis

Diagnostic

Minority Carrier Lifetime

Lifetime Testing

Sinton WCT-120 Lifetime Tester

Surface Recombination Velocity

Lifetime Testing

Sinton WCT-120 Lifetime Tester

Thermal Effusion

Thermal Effusion

Unknown

Chemical Composition, Impurities

FTIR, Fourier Transform InfraRed spectroscopy

Unknown

Chemical Composition, Impurities

RBS, Rutherford Backscattering Spectrometry

Unknown

Chemical Composition, Impurities

TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis

Unknown

Silicon

Passivation

147