Title: Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
Type: Journal
Info: JOURNAL OF APPLIED PHYSICS 106, 114907(2009)
Date: 2009-10-22
DOI: http://dx.doi.org/10.1063/1.3264572
Name
Institution
Eindhoven University of Technology
Q-CELLS SE
Q-CELLS SE
Forschungszentrum Jülich
Eindhoven University of Technology
Eindhoven University of Technology
Eindhoven University of Technology
Characteristic
Analysis
Diagnostic
Minority Carrier Lifetime
Lifetime Testing
Sinton WCT-120 Lifetime Tester
Surface Recombination Velocity
Lifetime Testing
Sinton WCT-120 Lifetime Tester
Thermal Effusion
Thermal Effusion
-
Chemical Composition, Impurities
FTIR, Fourier Transform InfraRed spectroscopy
-
Chemical Composition, Impurities
RBS, Rutherford Backscattering Spectrometry
-
Chemical Composition, Impurities
TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis
-
Silicon
Passivation
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