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An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
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P. Engelhart Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by P. Engelhart returned 2 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
2Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition