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Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
Experimental and numerical analysis of the effects of ion bombardment in silicon oxide (SiO2) plasma enhanced atomic layer deposition (PEALD) processes
Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride
Type:
Journal
Info:
J. Phys. Chem. Lett. 2015, 6, 3610-3614
Date:
2015-08-30
Author Information
| Name | Institution |
|---|---|
| Chaitanya Krishna Ande | Eindhoven University of Technology |
| Harm C. M. Knoops | Eindhoven University of Technology |
| Koen de Peuter | Eindhoven University of Technology |
| Maarten van Drunen | Eindhoven University of Technology |
| Simon D. Elliott | Tyndall National Institute, University College Cork |
| Erwin (W.M.M.) Kessels | Eindhoven University of Technology |
Films
Plasma SiNx
Plasma SiNx
Plasma SiNx
Plasma SiNx
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Substrates
| Silicon |
Keywords
Notes
| 523 |