Publication Information

Title:
Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride
Type:
Journal
Info:
J. Phys. Chem. Lett. 2015, 6, 3610-3614
Date:
2015-08-30

Author Information

Name Institution
Chaitanya Krishna AndeEindhoven University of Technology
Harm C. M. KnoopsEindhoven University of Technology
Koen de PeuterEindhoven University of Technology
Maarten van DrunenEindhoven University of Technology
Simon D. ElliottTyndall National Institute, University College Cork
Erwin (W.M.M.) KesselsEindhoven University of Technology

Films

Plasma SiNx



Plasma SiNx



Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Substrates

Silicon

Keywords

Notes

523