Search 1531 plasma ALD publications by:
Search 1531 plasma ALD publications by:
Publication Information
Title:
Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride
Type:
Journal
Info:
J. Phys. Chem. Lett. 2015, 6, 3610-3614
Date:
2015-08-30
Author Information
Name | Institution |
---|---|
Chaitanya Krishna Ande | Eindhoven University of Technology |
Harm C. M. Knoops | Eindhoven University of Technology |
Koen de Peuter | Eindhoven University of Technology |
Maarten van Drunen | Eindhoven University of Technology |
Simon D. Elliott | Tyndall National Institute, University College Cork |
Erwin (W.M.M.) Kessels | Eindhoven University of Technology |
Films
Plasma SiNx
Plasma SiNx
Plasma SiNx
Plasma SiNx
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Substrates
Silicon |
Keywords
Notes
523 |
Popular Precursors
Top Authors
Erwin (W.M.M.) Kessels |
Hyeongtag Jeon |
Hyungjun Kim |
Mauritius C. M. (Richard) van de Sanden |
Christophe Detavernier |