The publication database currently has 1609 entries.
Search from:
202 Films Compositions
272 Precursors and Plasma Gases
76 Deposition Hardwares
249 Film and Plasma Characteristics
85 Theses
Use Multifactor Search for more complex searches and for searching by other criteria (author, affiliation, analysis, deposition temperature)
ALD Links
Contact Us
Advertising
Recent Database Additions
Growth of Gallium Nitride Films on Multilayer Graphene Template Using Plasma-Enhanced Atomic Layer Deposition
Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
On the Contact Optimization of ALD-Based MoS2 FETs: Correlation of Processing Conditions and Interface Chemistry with Device Electrical Performance
Search 1609 plasma ALD publications by:
Search 1609 plasma ALD publications by:
Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride
Type:
Journal
Info:
J. Phys. Chem. Lett. 2015, 6, 3610-3614
Date:
2015-08-30
Author Information
| Name | Institution |
|---|---|
| Chaitanya Krishna Ande | Eindhoven University of Technology |
| Harm C. M. Knoops | Eindhoven University of Technology |
| Koen de Peuter | Eindhoven University of Technology |
| Maarten van Drunen | Eindhoven University of Technology |
| Simon D. Elliott | Tyndall National Institute, University College Cork |
| Erwin (W.M.M.) Kessels | Eindhoven University of Technology |
Films
Plasma SiNx
Plasma SiNx
Plasma SiNx
Plasma SiNx
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Substrates
| Silicon |
Keywords
Notes
| 523 |