Publication Information

Title: Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films

Type: Journal

Info: ACS Appl. Mater. Interfaces, 2014, 6 (13), pp 10656-10660

Date: 2014-06-19

DOI: http://dx.doi.org/10.1021/am502298z

Author Information

Name

Institution

Stanford University

Films

Thermal BaTiO3 using Custom ICP

Deposition Temperature = 250C

210758-43-3

546-68-9

7732-18-5

Deposition Temperature = 250C

75-24-1

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Substrates

Keywords

Notes

222



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