Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
Type:
Journal
Info:
Journal of The Electrochemical Society, 158 (5) C132-C138 (2011)
Date:
2011-01-27
Author Information
| Name | Institution |
|---|---|
| Stephen E. Potts | Eindhoven University of Technology |
| L. Schmalz | FEM Research Institute |
| M. Fenker | FEM Research Institute |
| B. Díaz | French National Centre for Scientific Research (CNRS) |
| J. Światowska | French National Centre for Scientific Research (CNRS) |
| V. Maurice | French National Centre for Scientific Research (CNRS) |
| A. Seyeux | French National Centre for Scientific Research (CNRS) |
| P. Marcus | French National Centre for Scientific Research (CNRS) |
| György Zoltán Radnóczi | Research Institute for Technical Physics and Materials Science |
| L. Tóth | Research Institute for Technical Physics and Materials Science |
| Erwin (W.M.M.) Kessels | Eindhoven University of Technology |
Films
Plasma Al2O3
Thermal Al2O3
Film/Plasma Properties
Characteristic: Porosity
Analysis: CV, Cyclic Voltammetry
Characteristic: Chemical Composition, Impurities
Analysis: TOF-SIMS, Time of Flight Secondary Ion Mass Spectrometry
Characteristic: Compositional Depth Profiling
Analysis: TOF-SIMS, Time of Flight Secondary Ion Mass Spectrometry
Characteristic: Conformality, Step Coverage
Analysis: TEM, Transmission Electron Microscope
Characteristic: Images
Analysis: TEM, Transmission Electron Microscope
Characteristic: Adhesion
Analysis: TEM, Transmission Electron Microscope
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Corrosion
Analysis: NSS, Neutral Salt Spray
Substrates
| Al2024-T3 Aluminium |
| 100Cr6 Steel |
Notes
| 699 |