Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Method of Fabrication for Encapsulated Polarizing Resonant Gratings

Type:
Journal
Info:
IEEE Photonics Technology Letters, Volume:25, Issue:15, 2013
Date:
2013-06-12
DOI:
http://dx.doi.org/10.1109/LPT.2013.2266575

Author Information

Name Institution
A. J. PungClemson University
S. R. CarlClemson University
I. R. SrimathiClemson University
E. G. JohnsonClemson University

Films

Plasma Al2O3

Hardware used: Oxford Instruments OpAL
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range N/A

Film/Plasma Properties

Substrates

SiO2

Notes

572