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Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
Experimental and numerical analysis of the effects of ion bombardment in silicon oxide (SiO2) plasma enhanced atomic layer deposition (PEALD) processes
Atomic layer deposition of AlN for thin membranes using trimethylaluminum and H2/N2 plasma
Type:
Journal
Info:
Applied Surface Science 338 (2015) 35 - 41
Date:
2015-02-17
Author Information
| Name | Institution |
|---|---|
| Sebastian Goerke | Leibniz Institute of Photonic Technology |
| Mario Ziegler | Leibniz Institute of Photonic Technology |
| Andreas Ihring | Leibniz Institute of Photonic Technology |
| Jan Dellith | Leibniz Institute of Photonic Technology |
| Andreas Undisz | Friedrich-Schiller-Universität Jena |
| Marco Diegel | Leibniz Institute of Photonic Technology |
| Solveig Anders | Leibniz Institute of Photonic Technology |
| Uwe Hübner | Leibniz Institute of Photonic Technology |
| Markus Rettenmayr | Friedrich-Schiller-Universität Jena |
| Hans-Georg Meyer | Leibniz Institute of Photonic Technology |
Films
Plasma AlN
Film/Plasma Properties
Substrates
Keywords
Notes
| 422 |