Publication Information

Title: Atomic layer deposition of AlN for thin membranes using trimethylaluminum and H2/N2 plasma

Type: Journal

Info: Applied Surface Science 338 (2015) 35 - 41

Date: 2015-02-17

DOI: http://dx.doi.org/10.1016/j.apsusc.2015.02.119

Author Information

Name

Institution

Leibniz Institute of Photonic Technology

Leibniz Institute of Photonic Technology

Leibniz Institute of Photonic Technology

Leibniz Institute of Photonic Technology

Friedrich-Schiller-Universität Jena

Leibniz Institute of Photonic Technology

Leibniz Institute of Photonic Technology

Leibniz Institute of Photonic Technology

Friedrich-Schiller-Universität Jena

Leibniz Institute of Photonic Technology

Films

Deposition Temperature Range N/A

75-24-1

7727-37-9

1333-74-0

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Substrates

Keywords

Notes

422



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