Publication Information

Title:
Atomic layer deposition of AlN for thin membranes using trimethylaluminum and H2/N2 plasma
Type:
Journal
Info:
Applied Surface Science 338 (2015) 35 - 41
Date:
2015-02-17

Author Information

Name Institution
Sebastian GoerkeLeibniz Institute of Photonic Technology
Mario ZieglerLeibniz Institute of Photonic Technology
Andreas IhringLeibniz Institute of Photonic Technology
Jan DellithLeibniz Institute of Photonic Technology
Andreas UndiszFriedrich-Schiller-Universität Jena
Marco DiegelLeibniz Institute of Photonic Technology
Solveig AndersLeibniz Institute of Photonic Technology
Uwe HübnerLeibniz Institute of Photonic Technology
Markus RettenmayrFriedrich-Schiller-Universität Jena
Hans-Georg MeyerLeibniz Institute of Photonic Technology

Films

Plasma AlN


Film/Plasma Properties

Substrates

Keywords

Notes

422