Search 1525 plasma ALD publications by:
Search 1525 plasma ALD publications by:
Publication Information
Title:
Atomic layer deposition of AlN for thin membranes using trimethylaluminum and H2/N2 plasma
Type:
Journal
Info:
Applied Surface Science 338 (2015) 35 - 41
Date:
2015-02-17
Author Information
Name | Institution |
---|---|
Sebastian Goerke | Leibniz Institute of Photonic Technology |
Mario Ziegler | Leibniz Institute of Photonic Technology |
Andreas Ihring | Leibniz Institute of Photonic Technology |
Jan Dellith | Leibniz Institute of Photonic Technology |
Andreas Undisz | Friedrich-Schiller-Universität Jena |
Marco Diegel | Leibniz Institute of Photonic Technology |
Solveig Anders | Leibniz Institute of Photonic Technology |
Uwe Hübner | Leibniz Institute of Photonic Technology |
Markus Rettenmayr | Friedrich-Schiller-Universität Jena |
Hans-Georg Meyer | Leibniz Institute of Photonic Technology |
Films
Plasma AlN
Film/Plasma Properties
Substrates
Keywords
Notes
422 |
Popular Precursors
Top Authors
Erwin (W.M.M.) Kessels |
Hyeongtag Jeon |
Hyungjun Kim |
Mauritius C. M. (Richard) van de Sanden |
Christophe Detavernier |