Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Background-Free Bottom-Up Plasmonic Arrays with Increased Sensitivity, Specificity and Shelf Life for SERS Detection Schemes

Type:
Journal
Info:
J. Phys. Chem. C, 2015, 119 (24), pp 13791-13798
Date:
2015-05-22
DOI:
http://dx.doi.org/10.1021/acs.jpcc.5b01389

Author Information

Name Institution
Sezin YükselFriedrich-Schiller-Universität Jena
Mario ZieglerLeibniz Institute of Photonic Technology
Sebastian GoerkeLeibniz Institute of Photonic Technology
Uwe HübnerLeibniz Institute of Photonic Technology
Kilian PollokFriedrich-Schiller-Universität Jena
Falko LangenhorstFriedrich-Schiller-Universität Jena
Karina WeberFriedrich-Schiller-Universität Jena
Dana Cialla-MayFriedrich-Schiller-Universität Jena
Jürgen PoppFriedrich-Schiller-Universität Jena

Films

Plasma Al2O3

Hardware used: Oxford Instruments OpAL
Deposition Temperature Range N/A

Film/Plasma Properties

Substrates

Ag

Notes

427