Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Electrically Excited Plasmonic Nanoruler for Biomolecule Detection

Type:
Journal
Info:
Nano Lett., 2016, 16 (9), pp 5728-5736
Date:
2016-08-22
DOI:
http://dx.doi.org/10.1021/acs.nanolett.6b02414

Author Information

Name Institution
André DatheLeibniz Institute of Photonic Technology
Mario ZieglerLeibniz Institute of Photonic Technology
Uwe HübnerLeibniz Institute of Photonic Technology
Wolfgang FritzscheLeibniz Institute of Photonic Technology
Ondrej StranikLeibniz Institute of Photonic Technology

Films

Plasma Al2O3

Hardware used: Oxford Instruments OpAL
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 30C

Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: J.A. Woollam M-2000

Substrates

Silicon
Photoresist

Notes

857