Publication Information

Title:
Firing Stable Al2O3/SiNx Layer Stack Passivation for the Front Side Boron Emitter of n-type Silicon Solar Cells
Type:
Conference Proceedings
Info:
25th European PV Solar Energy Conference and Exhibition,6-10 September 2010, Valencia, Spain
Date:
2010-09-06

Author Information

Name Institution
Armin RichterFraunhofer Institute for Solar Energy Systems (ISE)
H. HenneckFraunhofer Institute for Solar Energy Systems (ISE)
J. BenickFraunhofer Institute for Solar Energy Systems (ISE)
M. HörteisFraunhofer Institute for Solar Energy Systems (ISE)
M. HermleFraunhofer Institute for Solar Energy Systems (ISE)
S. W. GlunzFraunhofer Institute for Solar Energy Systems (ISE)

Films

Plasma Al2O3


Film/Plasma Properties

Characteristic: Minority Carrier Lifetime
Analysis: QSSPC, Quasi-Steady-State PhotoConductance Decay

Characteristic: Emitter Saturation Current Density
Analysis: -

Characteristic: Chemical Composition, Impurities
Analysis: FTIR, Fourier Transform InfraRed spectroscopy

Substrates

Si(100)

Keywords

n-type Silicon Solar Cell
Boron Emitter
Aluminum Oxide Passivation
Blistering

Notes

56