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An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
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M. Hermle Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by M. Hermle returned 3 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Firing Stable Al2O3/SiNx Layer Stack Passivation for the Front Side Boron Emitter of n-type Silicon Solar Cells
2Minority carrier lifetime limitations in Si wafer solar cells with gallium phosphide window layers
3Electron-selective contacts via ultra-thin organic interface dipoles for silicon organic heterojunction solar cells