Hafnia and alumina on sulphur passivated germanium
Type:
Journal
Info:
Vacuum, Volume 122, Part B, 2015, Pages 306 - 309
Date:
2015-03-18
Author Information
| Name | Institution |
|---|---|
| M. Althobaiti | University of Liverpool |
| S. Mather | University of Liverpool |
| Naser Sedghi | University of Liverpool |
| Vinod R. Dhanak | University of Liverpool |
| Ivona Z. Mitrovic | University of Liverpool |
| Steve Hall | University of Liverpool |
| Paul R. Chalker | University of Liverpool |
Films
Plasma HfO2
Thermal HfO2
Plasma Al2O3
Thermal Al2O3
Film/Plasma Properties
Characteristic: Interfacial Layer
Analysis: XPS, X-ray Photoelectron Spectroscopy
Substrates
| Ge |
Notes
| 478 |