Publication Information

Title:
Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 30, 01A101 (2012)
Date:
2011-06-22

Author Information

Name Institution
Harm C. M. KnoopsEindhoven University of Technology
E. LangereisEindhoven University of Technology
Mauritius C. M. (Richard) van de SandenEindhoven University of Technology
Erwin (W.M.M.) KesselsEindhoven University of Technology

Films



Film/Plasma Properties

Characteristic: Gas Phase Species
Analysis: QMS, Quadrupole Mass Spectrometer

Characteristic: Gas Phase Species
Analysis: OES, Optical Emission Spectroscopy

Characteristic: Thickness
Analysis: Ellipsometry

Substrates

Keywords

Reaction Mechanism

Notes

Contains nice list of publication references discussing plasma ALD reaction mechanisms.
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