
Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 30, 01A101 (2012)
Date:
2011-06-22
Author Information
Name | Institution |
---|---|
Harm C. M. Knoops | Eindhoven University of Technology |
E. Langereis | Eindhoven University of Technology |
Mauritius C. M. (Richard) van de Sanden | Eindhoven University of Technology |
Erwin (W.M.M.) Kessels | Eindhoven University of Technology |
Films
Plasma TaNx
Plasma TaNx
Film/Plasma Properties
Characteristic: Gas Phase Species
Analysis: QMS, Quadrupole Mass Spectrometer
Characteristic: Gas Phase Species
Analysis: OES, Optical Emission Spectroscopy
Characteristic: Thickness
Analysis: Ellipsometry
Substrates
Notes
Contains nice list of publication references discussing plasma ALD reaction mechanisms. |
663 |